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The future of high-k on pure germanium and its importance for Ge CMOS
Publication:
The future of high-k on pure germanium and its importance for Ge CMOS
Date
2005
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Meuris, Marc
;
Delabie, Annelies
;
Van Elshocht, Sven
;
Kubicek, Stefan
;
Verheyen, Peter
;
De Jaeger, Brice
;
Van Steenbergen, Jan
;
Winderickx, Gillis
;
Van Moorhem, Els
;
Puurunen, R.
;
Brijs, Bert
;
Caymax, Matty
;
Conard, Thierry
;
Richard, Olivier
;
Vandervorst, Wilfried
;
Zhao, Chao
;
De Gendt, Stefan
;
Schram, Tom
;
Chiarella, Thomas
;
Onsia, Bart
;
Teerlinck, I
;
Houssa, Michel
;
Mertens, Paul
;
Raskin, G.
;
Mijlemans, P.
;
Biesemans, Serge
;
Heyns, Marc
Journal
Materials Science in Semiconductor Processing
Abstract
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1922
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1922
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations