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Low voltage stress-induced leakage current in 1.4 - 2.1 nm SiON and HfSiON gate dielectric layers
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Authors
O'Connor, Robert
;
McDonnell, Stephen
;
Hughes, Greg
;
Degraeve, Robin
;
Kauerauf, Thomas
Journal
Semiconductor Science and Technology
Volume
20
Title
Low voltage stress-induced leakage current in 1.4 - 2.1 nm SiON and HfSiON gate dielectric layers
Publication type
Journal article
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