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BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves

dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorHermans, Jan
dc.contributor.authorFoubert, Philippe
dc.contributor.authorWiaux, Vincent
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-16T03:48:00Z
dc.date.available2021-10-16T03:48:00Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10961
dc.sourceIIOimport
dc.titleBARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
dc.typeOral presentation
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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