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Resist profile control in immersion lithography using scatterometry measurements

dc.contributor.authorPollentier, Ivan
dc.contributor.authorErcken, Monique
dc.contributor.authorFoubert, Philippe
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-16T04:08:53Z
dc.date.available2021-10-16T04:08:53Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11032
dc.sourceIIOimport
dc.titleResist profile control in immersion lithography using scatterometry measurements
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewno
dc.source.beginpage129
dc.source.endpage140
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5754


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