Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process
| dc.contributor.author | Puurunen, Riikka | |
| dc.date.accessioned | 2021-10-16T04:18:20Z | |
| dc.date.available | 2021-10-16T04:18:20Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11063 | |
| dc.source | IIOimport | |
| dc.title | Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process | |
| dc.type | Journal article | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 121301 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.issue | 12 | |
| dc.source.volume | 97 | |
| imec.availability | Published - imec |
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