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Oxygen ion beam oxidation of silicon: an ESCA study

dc.contributor.authorBuiu, O.
dc.contributor.authorOsiceanu, Petre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCozar, O.
dc.date.accessioned2021-09-29T14:18:12Z
dc.date.available2021-09-29T14:18:12Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1107
dc.sourceIIOimport
dc.titleOxygen ion beam oxidation of silicon: an ESCA study
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage143
dc.source.endpage148
dc.source.conferenceProceedings of the Symposium on Surface Oxide Films
dc.source.conferencedate6/10/1996
dc.source.conferencelocationSan Antonio, TX USA
imec.availabilityPublished - open access
imec.internalnotesESC Proceedings; Vol. 96-18


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