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SIGEM, low temperature deposition of poly-SiGe MEMs structures on standard CMOS circuits

dc.contributor.authorRamos-Martos, Juan
dc.contributor.authorCeballos-Caceres, Joaquin
dc.contributor.authorRagel-Morales, Antonio
dc.contributor.authorMora=-Gutierrez, Jose Miguel
dc.contributor.authorArias-Drake, Alberto
dc.contributor.authorLagos-Florido, Miguel-ANgel
dc.contributor.authorMunoz-Hinojosa, Jose Maria
dc.contributor.authorMehta, Anshu
dc.contributor.authorVerbist, Agnes
dc.contributor.authorDu Bois, Bert
dc.contributor.authorKehr, Kersten
dc.contributor.authorLeinenbach, Christina
dc.contributor.authorVan Aerde, Steven
dc.contributor.authorSpengler, Jorg
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-16T04:24:30Z
dc.date.available2021-10-16T04:24:30Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11082
dc.sourceIIOimport
dc.titleSIGEM, low temperature deposition of poly-SiGe MEMs structures on standard CMOS circuits
dc.typeProceedings paper
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorVan Aerde, Steven
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.source.peerreviewno
dc.source.beginpage293
dc.source.endpage306
dc.source.conferenceSmart Sensors, Actuators, and MEMS II
dc.source.conferencedate9/05/2005
dc.source.conferencelocationSevilla Spain
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5836


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