Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacks
dc.contributor.author | Ranjan, R. | |
dc.contributor.author | Pey, K.L. | |
dc.contributor.author | Tung, C.H. | |
dc.contributor.author | Tang, L.J. | |
dc.contributor.author | Ang, D.S. | |
dc.contributor.author | Groeseneken, Guido | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Bera, L.K. | |
dc.date.accessioned | 2021-10-16T04:24:49Z | |
dc.date.available | 2021-10-16T04:24:49Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11083 | |
dc.source | IIOimport | |
dc.title | Breakdown induced thermo-chemical reactions in HfO2 high-k/poly-silicon gate stacks | |
dc.type | Journal article | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.beginpage | 242907-1 | |
dc.source.endpage | 242907-3 | |
dc.source.journal | Applied Physics Letters | |
dc.source.issue | 24 | |
dc.source.volume | 87 | |
imec.availability | Published - imec |
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