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Progress in 193nm immersion lithography at IMEC

dc.contributor.authorRonse, Kurt
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHendrickx, Eric
dc.contributor.authorLeunissen, Peter
dc.contributor.authorAksenov, Yuri
dc.date.accessioned2021-10-16T04:37:47Z
dc.date.available2021-10-16T04:37:47Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11125
dc.sourceIIOimport
dc.titleProgress in 193nm immersion lithography at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage6
dc.source.endpage12
dc.source.conference21st European Mask and Lithography Conference
dc.source.conferencedate31/01/2005
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5835


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