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Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface

dc.contributor.authorSano, Ken-Ichi
dc.contributor.authorIzumi, A.
dc.contributor.authorEitoku, Atsuro
dc.contributor.authorSnow, Jim
dc.contributor.authorKesters, Els
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-16T04:50:15Z
dc.date.available2021-10-16T04:50:15Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11164
dc.sourceIIOimport
dc.titleSingle-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
dc.typeProceedings paper
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.beginpage134
dc.source.endpage141
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing IX
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA US
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 1, nr 3


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