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Ion implantation in Ge and associated defect control

dc.contributor.authorSatta, Alessandra
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJanssens, Tom
dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorClarysse, Trudo
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorGeenen, Luc
dc.contributor.authorBrijs, Bert
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T04:51:22Z
dc.date.available2021-10-16T04:51:22Z
dc.date.issued2005-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11167
dc.sourceIIOimport
dc.titleIon implantation in Ge and associated defect control
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.beginpage52
dc.source.endpage58
dc.source.conferenceCrystalline Defects and Contamination: Their Impact and Control in Device Manufacturing IV
dc.source.conferencedate14/09/2005
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; Vol. 2005-10


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