dc.contributor.author | Satta, Alessandra | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Janssens, Tom | |
dc.contributor.author | Clarysse, Trudo | |
dc.contributor.author | Demeurisse, Caroline | |
dc.contributor.author | Hoflijk, Ilse | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.date.accessioned | 2021-10-16T04:51:44Z | |
dc.date.available | 2021-10-16T04:51:44Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11168 | |
dc.source | IIOimport | |
dc.title | Dopants for N and P junctions in germanium | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Demeurisse, Caroline | |
dc.contributor.imecauthor | Hoflijk, Ilse | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.source.peerreview | no | |
dc.source.beginpage | 468 | |
dc.source.endpage | 475 | |
dc.source.conference | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment | |
dc.source.conferencedate | 16/05/2005 | |
dc.source.conferencelocation | Quebec Canada | |
imec.availability | Published - imec | |
imec.internalnotes | Electrochemical Society Proceedings; Vol. 2005-05 | |