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Deposition of undoped and in-situ doped amorphous and polycrystalline silicon with LPCVD

dc.contributor.authorSchaekers, Marc
dc.contributor.authorShi, Xiaoping
dc.date.accessioned2021-10-16T04:52:02Z
dc.date.available2021-10-16T04:52:02Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11169
dc.sourceIIOimport
dc.titleDeposition of undoped and in-situ doped amorphous and polycrystalline silicon with LPCVD
dc.typeProceedings paper
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage652
dc.source.endpage658
dc.source.conference15th European Conference on Chemical Vapor Deposition - EUROCVD-15
dc.source.conferencedate4/09/2005
dc.source.conferencelocationBochum Germany
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; Vol. 2005-09


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