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Implementation of atomic layer deposition in advanced semiconductor processes

dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Ammel, Annemie
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorDelabie, Annelies
dc.contributor.authorMartin Hoyas, Ana
dc.contributor.authorZhao, Chao
dc.date.accessioned2021-10-16T04:52:22Z
dc.date.available2021-10-16T04:52:22Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11170
dc.sourceIIOimport
dc.titleImplementation of atomic layer deposition in advanced semiconductor processes
dc.typeMeeting abstract
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVan Ammel, Annemie
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.beginpage451
dc.source.conferenceMeeting Abstracts Electrochamical Society Fall Meeting
dc.source.conferencedate16/10/2005
dc.source.conferencelocationLos Angeles, CA USA
imec.availabilityPublished - imec


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