dc.contributor.author | Scheerlinck, S. | |
dc.contributor.author | Van Thourhout, Dries | |
dc.contributor.author | Baets, Roel | |
dc.date.accessioned | 2021-10-16T04:52:40Z | |
dc.date.available | 2021-10-16T04:52:40Z | |
dc.date.issued | 2005-12 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11171 | |
dc.source | IIOimport | |
dc.title | Nano imprint lithography for photonic structure patterning | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Thourhout, Dries | |
dc.contributor.imecauthor | Baets, Roel | |
dc.contributor.orcidimec | Van Thourhout, Dries::0000-0003-0111-431X | |
dc.contributor.orcidimec | Baets, Roel::0000-0003-1266-1319 | |
dc.source.peerreview | no | |
dc.source.beginpage | 63 | |
dc.source.endpage | 66 | |
dc.source.conference | Symposium IEEE/LEOS Benelux Chapter | |
dc.source.conferencedate | 1/12/2005 | |
dc.source.conferencelocation | Mons Belgium | |
imec.availability | Published - imec | |
imec.internalnotes | ISBN 2-9600226-4-5 | |