Show simple item record

Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates

dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-10-16T04:59:57Z
dc.date.available2021-10-16T04:59:57Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11193
dc.sourceIIOimport
dc.titleInfluence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
dc.typeJournal article
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage2194
dc.source.endpage2197
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue5
dc.source.volume23
imec.availabilityPublished - imec
imec.internalnotesPaper from the 6th AVS International Conference on Microelectronics and Interfaces


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record