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Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
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Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
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Date
2005
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shamiryan, Denis
;
Paraschiv, Vasile
;
Locorotondo, Sabrina
;
Beckx, Stephan
;
Boullart, Werner
;
Vanhaelemeersch, Serge
Journal
Journal of Vacuum Science and Technology B
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1847
since deposited on 2021-10-16
Acq. date: 2026-01-09
Citations
Metrics
Views
1847
since deposited on 2021-10-16
Acq. date: 2026-01-09
Citations