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Metal gate work function extraction using Fowler-Nordheim tunneling techniques

dc.contributor.authorSjöblom, G.
dc.contributor.authorPantisano, Luigi
dc.contributor.authorSchram, Tom
dc.contributor.authorOlsson, J.
dc.contributor.authorAfanas'ev, V.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T05:08:30Z
dc.date.available2021-10-16T05:08:30Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11218
dc.sourceIIOimport
dc.titleMetal gate work function extraction using Fowler-Nordheim tunneling techniques
dc.typeJournal article
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.beginpage280
dc.source.endpage283
dc.source.journalMicroelectronic Engineering
dc.source.volume80
imec.availabilityPublished - imec
imec.internalnotesPaper from the 14th biennial Conference on Insulating Films on Semiconductors, Leuven, June 2005


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