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dc.contributor.authorSnow, Jim
dc.contributor.authorKraus, Harald
dc.contributor.authorFano Leston, Vanessa
dc.contributor.authorXu, Kaidong
dc.contributor.authorMertens, Paul
dc.contributor.authorKovacs, Fredi
dc.date.accessioned2021-10-16T05:17:48Z
dc.date.available2021-10-16T05:17:48Z
dc.date.issued2005-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11248
dc.sourceIIOimport
dc.titleSelective wet etching of nickel
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conferenceSEMATECH Wafer Clean & Surface Prep Conference
dc.source.conferencedate18/04/2005
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec


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