dc.contributor.author | Srinivasan, P. | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Pantisano, Luigi | |
dc.contributor.author | Claeys, Cor | |
dc.contributor.author | Misra, D. | |
dc.date.accessioned | 2021-10-16T05:21:54Z | |
dc.date.available | 2021-10-16T05:21:54Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11260 | |
dc.source | IIOimport | |
dc.title | l/f Noise performance of n-MOSFETs with Hf-based gate dielectrics | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.source.peerreview | no | |
dc.source.beginpage | 151 | |
dc.source.endpage | 160 | |
dc.source.conference | Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS: New Materials, Processes and Equipment | |
dc.source.conferencedate | 16/05/2005 | |
dc.source.conferencelocation | Quebec Canada | |
imec.availability | Published - imec | |
imec.internalnotes | Electrochemical Society Proceedings; Vol. PV 2005-05 | |