Metrology accuracy and stability: the fundamental baseline for process monitoring and control
| dc.contributor.author | Storms, Greet | |
| dc.contributor.author | Barry, Kelly | |
| dc.contributor.author | Cheng, Shaunee | |
| dc.date.accessioned | 2021-10-16T05:30:02Z | |
| dc.date.available | 2021-10-16T05:30:02Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11284 | |
| dc.source | IIOimport | |
| dc.title | Metrology accuracy and stability: the fundamental baseline for process monitoring and control | |
| dc.type | Proceedings paper | |
| dc.source.peerreview | no | |
| dc.source.conference | AEC/APC -Asia Symposium | |
| dc.source.conferencedate | 1/12/2005 | |
| dc.source.conferencelocation | ShinChu Taiwan | |
| imec.availability | Published - imec |
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