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Engineering ALCVD HfSiO gate stacks for LSTP applications

dc.contributor.authorSwerts, Johan
dc.contributor.authorDeweerd, Wim
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorMaes, Jan
dc.contributor.authorWilk, Glenn
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-16T05:33:47Z
dc.date.available2021-10-16T05:33:47Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11294
dc.sourceIIOimport
dc.titleEngineering ALCVD HfSiO gate stacks for LSTP applications
dc.typeOral presentation
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDelabie, Annelies
dc.source.peerreviewno
dc.source.conferenceAVS 5th International Conference on ALD
dc.source.conferencedate8/08/2005
dc.source.conferencelocation
imec.availabilityPublished - imec


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