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A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

dc.contributor.authorTravaly, Youssef
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorRichard, Olivier
dc.contributor.authorBrijs, Bert
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.contributor.authorAbell, Thomas
dc.contributor.authorSomers, K.R.F
dc.contributor.authorHendrickx, M.F.A
dc.contributor.authorVanquickenborne, L.G.
dc.contributor.authorCeulemans, A.
dc.contributor.authorJonas, A.M
dc.date.accessioned2021-10-16T05:47:14Z
dc.date.available2021-10-16T05:47:14Z
dc.date.issued2005-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11331
dc.sourceIIOimport
dc.titleA theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates
dc.typeJournal article
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage083515-1
dc.source.endpage083515-9
dc.source.journalJournal of Applied Physics
dc.source.issue8
dc.source.volume98
imec.availabilityPublished - imec


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