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Surface preparation techniques for high-k deposition on Ge substrates

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorOnsia, Bart
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorZhao, Chao
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T06:08:10Z
dc.date.available2021-10-16T06:08:10Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11391
dc.sourceIIOimport
dc.titleSurface preparation techniques for high-k deposition on Ge substrates
dc.typeProceedings paper
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.beginpage31
dc.source.endpage34
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena Vol 103-104


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