Show simple item record

Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric

dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorWeber, U.
dc.contributor.authorConard, Thierry
dc.contributor.authorKaushik, Vidya
dc.contributor.authorHoussa, Michel
dc.contributor.authorHyun, Sangjin
dc.contributor.authorSeitzinger, Bernard
dc.contributor.authorLehnen, Peer
dc.contributor.authorSchuhmacher, M.
dc.contributor.authorLindner, J.
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T06:08:36Z
dc.date.available2021-10-16T06:08:36Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11392
dc.sourceIIOimport
dc.titleElectrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric
dc.typeJournal article
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpageF185
dc.source.endpageF189
dc.source.journalJournal of the Electrochemical Society
dc.source.issue11
dc.source.volume152
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record