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Image imbalance compensation in alternating phase-shift masks towards the 45 node through-pitch imaging

dc.contributor.authorVan Look, Lieve
dc.contributor.authorKasprowicz, Bryan
dc.contributor.authorZibold, Axel
dc.contributor.authorDegel, Wolfgang
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T06:15:19Z
dc.date.available2021-10-16T06:15:19Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11411
dc.sourceIIOimport
dc.titleImage imbalance compensation in alternating phase-shift masks towards the 45 node through-pitch imaging
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage59921S
dc.source.conference25th Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate2/10/2005
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5992


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