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Optical extensions integration for a 0.314-μm² 45-nm node 6-transistor SRAM cell

dc.contributor.authorVerhaegen, Staf
dc.contributor.authorNackaerts, Axel
dc.contributor.authorWiaux, Vincent
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T06:49:28Z
dc.date.available2021-10-16T06:49:28Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11507
dc.sourceIIOimport
dc.titleOptical extensions integration for a 0.314-μm² 45-nm node 6-transistor SRAM cell
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.source.peerreviewno
dc.source.beginpage120
dc.source.endpage130
dc.source.conferenceDesign and Process Integration for Microlithography III
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5756


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