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RET imaging capbility with 0.85NA ArF immersion lithography

dc.contributor.authorWiaux, Vincent
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVan Look, Lieve
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T07:08:16Z
dc.date.available2021-10-16T07:08:16Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11556
dc.sourceIIOimport
dc.titleRET imaging capbility with 0.85NA ArF immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewno
dc.source.conference2nd International Symposium on Immersion Lithography
dc.source.conferencedate12/09/2005
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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