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Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography

dc.contributor.authorYoshizawa, Masaki
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-16T07:23:50Z
dc.date.available2021-10-16T07:23:50Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11596
dc.sourceIIOimport
dc.titleImpact of the absorber thickness variation on the imaging performance of ArF immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage243
dc.source.endpage251
dc.source.conferenceFundamental Problems of Optoelectronics and Microelectronics II
dc.source.conferencedate13/04/2005
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5853


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