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Mask enhancer technology for 45-nm node contact hole fabrication

dc.contributor.authorYuito, Takashi
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVan Look, Lieve
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorIrie, Shigeo
dc.contributor.authorMatsuo, Takahiro
dc.contributor.authorMisaka, Akio
dc.contributor.authorWatanabe, Hisashi
dc.contributor.authorSasago, Masru
dc.date.accessioned2021-10-16T07:25:48Z
dc.date.available2021-10-16T07:25:48Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11600
dc.sourceIIOimport
dc.titleMask enhancer technology for 45-nm node contact hole fabrication
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage1377
dc.source.endpage1387
dc.source.conferenceOptical Microlithography XVIII
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5754


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