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Geometry effect on impurity incorporation and grain growth in narrow copper lines

dc.contributor.authorZhang, Wenqi
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorHeylen, Nancy
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-16T07:26:36Z
dc.date.available2021-10-16T07:26:36Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11602
dc.sourceIIOimport
dc.titleGeometry effect on impurity incorporation and grain growth in narrow copper lines
dc.typeJournal article
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.source.peerreviewno
dc.source.beginpageC832
dc.source.endpageC837
dc.source.journalJournal of the Electrochemical Society
dc.source.issue12
dc.source.volume152
imec.availabilityPublished - imec


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