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Ternary rare-earth metal oxide high-k layers on silicon oxide

dc.contributor.authorZhao, Chao
dc.contributor.authorWitters, Thomas
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Olivier
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeeg, T.
dc.contributor.authorSchubert, J.
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-16T07:29:35Z
dc.date.available2021-10-16T07:29:35Z
dc.date.issued2005-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11609
dc.sourceIIOimport
dc.titleTernary rare-earth metal oxide high-k layers on silicon oxide
dc.typeJournal article
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage132903-1
dc.source.endpage132903-3
dc.source.journalApplied Physics Letters
dc.source.issue13
dc.source.volume86
imec.availabilityPublished - imec


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