Show simple item record

Optical emission during the plasma etch for process control of the litho-etch bias

dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorKunnen, Eddy
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T15:00:24Z
dc.date.available2021-10-16T15:00:24Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11639
dc.sourceIIOimport
dc.titleOptical emission during the plasma etch for process control of the litho-etch bias
dc.typeProceedings paper
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.beginpage377
dc.source.endpage379
dc.source.conferenceInternational Symposium on Semiconductor Manufacturing
dc.source.conferencedate15/10/2007
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record