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Towards the understanding of CH3F/O2 chemistry

dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorKunnen, Eddy
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T15:00:26Z
dc.date.available2021-10-16T15:00:26Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11640
dc.sourceIIOimport
dc.titleTowards the understanding of CH3F/O2 chemistry
dc.typeOral presentation
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microelectronics. 1st International Workshop
dc.source.conferencedate10/09/2007
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://www.pesm2007.be/
imec.availabilityPublished - imec


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