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Particle removal from Si substrates in organic solvents using megasonic energy

dc.contributor.authorBarbagini, Francesca
dc.contributor.authorJanssens, Tom
dc.contributor.authorBearda, Twan
dc.contributor.authorArmini, Silvia
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorMertens, Paul
dc.contributor.authorFransaer, Jan
dc.date.accessioned2021-10-16T15:02:26Z
dc.date.available2021-10-16T15:02:26Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11693
dc.sourceIIOimport
dc.titleParticle removal from Si substrates in organic solvents using megasonic energy
dc.typeProceedings paper
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage101
dc.source.endpage108
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Trans.; Vol. 11, issue 2


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