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Phase and mechanical stress in and surrounding TiSi2 and CoSi2 lines studied by micro-Raman spectroscopy

dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorHoward, Dave
dc.contributor.authorMaex, Karen
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-09-29T14:23:49Z
dc.date.available2021-09-29T14:23:49Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1174
dc.sourceIIOimport
dc.titlePhase and mechanical stress in and surrounding TiSi2 and CoSi2 lines studied by micro-Raman spectroscopy
dc.typeProceedings paper
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage47
dc.source.endpage52
dc.source.conferenceAdvanced Metallization for Future ULSI
dc.source.conferencedate7/04/1996
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 427


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