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Study of Ni-Silicide contacts to Si:C source/drain

dc.contributor.authorCho, Moon Ju
dc.contributor.authorNouri, F.
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorKim, Y.
dc.contributor.authorMertens, Sofie
dc.contributor.authorVerheyen, Peter
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorVrancken, Christa
dc.contributor.authorRichard, Olivier
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLauwers, Anne
dc.contributor.authorBender, Hugo
dc.contributor.authorVan Daele, Benny
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorGeenen, Luc
dc.contributor.authorAbsil, Philippe
dc.contributor.authorKubicek, Stefan
dc.contributor.authorDemeurisse, Caroline
dc.date.accessioned2021-10-16T15:17:43Z
dc.date.available2021-10-16T15:17:43Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11861
dc.sourceIIOimport
dc.titleStudy of Ni-Silicide contacts to Si:C source/drain
dc.typeJournal article
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage92
dc.source.endpage98
dc.source.journalSemiconductor Fabtech
dc.source.issue34
imec.availabilityPublished - open access


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