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Processing and defect control in advanced Ge technologies

dc.contributor.authorClaeys, Cor
dc.contributor.authorSimoen, Eddy
dc.contributor.authorSatta, Alessandra
dc.contributor.authorOpsomer, Karl
dc.contributor.authorMeuris, Marc
dc.date.accessioned2021-10-16T15:20:25Z
dc.date.available2021-10-16T15:20:25Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11882
dc.sourceIIOimport
dc.titleProcessing and defect control in advanced Ge technologies
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conferenceProceedings of the IEEE International Workshop on Electron Devices Semiconductor Technology - EDST
dc.source.conferencedate3/06/2007
dc.source.conferencelocationBeijing China
imec.availabilityPublished - imec


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