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Improvement of resistance switching characteristics in NiO films obtained from controlled Ni oxidation

dc.contributor.authorCourtade, Lorene
dc.contributor.authorTurquat, Christian
dc.contributor.authorMuller, Christophe
dc.contributor.authorLisoni, Judit
dc.contributor.authorGoux, Ludovic
dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-16T15:25:07Z
dc.date.available2021-10-16T15:25:07Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11916
dc.sourceIIOimport
dc.titleImprovement of resistance switching characteristics in NiO films obtained from controlled Ni oxidation
dc.typeProceedings paper
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.source.peerreviewno
dc.source.conference8th Annual Non-Volatile Memory Technology Symposium
dc.source.conferencedate10/11/2007
dc.source.conferencelocationAlbuquerque, NM USA
imec.availabilityPublished - imec


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