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dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBirkner, Robert
dc.contributor.authorButtgereit, Uwe
dc.contributor.authorRichter, Rigo
dc.contributor.authorScherübl, Thomas
dc.date.accessioned2021-10-16T15:29:12Z
dc.date.available2021-10-16T15:29:12Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11943
dc.sourceIIOimport
dc.titleUsing the AIMS 45-193i for hyper-NA imaging applications
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage67301G
dc.source.conferenceSPIE Photomask Technology (BACUS)
dc.source.conferencedate18/09/2007
dc.source.conferencelocationMonterey (CA) USA
imec.availabilityPublished - open access
imec.internalnotesSPIE Proc.; Vol. 6730


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