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Soft breakdown of ultra-thin gate oxide layers

dc.contributor.authorDepas, Michel
dc.contributor.authorNigam, Tanya
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T14:27:07Z
dc.date.available2021-09-29T14:27:07Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1204
dc.sourceIIOimport
dc.titleSoft breakdown of ultra-thin gate oxide layers
dc.typeJournal article
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1499
dc.source.endpage1504
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue9
dc.source.volume43
imec.availabilityPublished - open access


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