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Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner

dc.contributor.authorD'have, Koen
dc.contributor.authorMachida, Takahiro
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-16T15:50:21Z
dc.date.available2021-10-16T15:50:21Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12069
dc.sourceIIOimport
dc.titleComparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
dc.typeProceedings paper
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.source.peerreviewno
dc.source.beginpage651805
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXI
dc.source.conferencedate25/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc.; Vol. 6518


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