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A new method for the production of ultra-thin crystalline Si wafers

dc.contributor.authorDross, Frederic
dc.contributor.authorMilhe, Aurelien
dc.contributor.authorRobbelein, Jo
dc.contributor.authorGordon, Ivan
dc.contributor.authorBouchard, Pierre-Olivier
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-16T15:56:36Z
dc.date.available2021-10-16T15:56:36Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12102
dc.sourceIIOimport
dc.titleA new method for the production of ultra-thin crystalline Si wafers
dc.typeProceedings paper
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage704
dc.source.endpage705
dc.source.conferenceTechnical Digest 17th International Photovoltaic Science and Engineering Conference - PVSEC
dc.source.conferencedate3/12/2007
dc.source.conferencelocationFukuoka Japan
imec.availabilityPublished - open access


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