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Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

dc.contributor.authorDusa, Mircea
dc.contributor.authorQuaedackers, John
dc.contributor.authorLarsen, Olaf F.A.
dc.contributor.authorMeessen, J.
dc.contributor.authorvan der Heijden, Eddy
dc.contributor.authorDicker, Gerald
dc.contributor.authorWismans, Onno
dc.contributor.authorde Haas, Paul
dc.contributor.authorvan Ingen Schenau, Koen
dc.contributor.authorFinders, Jo
dc.contributor.authorVleeming, Bert
dc.contributor.authorStorms, Greet
dc.contributor.authorJaenen, Patrick
dc.contributor.authorCheng, Shaunee
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-16T15:58:33Z
dc.date.available2021-10-16T15:58:33Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12112
dc.sourceIIOimport
dc.titlePitch doubling through dual-patterning lithography challenges in integration and litho budgets
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorJaenen, Patrick
dc.source.peerreviewno
dc.source.beginpage65200G
dc.source.conferenceOptical Microlithography XX
dc.source.conferencedate27/02/2007
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proc.; Vol. 6520


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