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Scalability of stress induced by contact-etch-stop layers: a simulation study

dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-16T16:01:15Z
dc.date.available2021-10-16T16:01:15Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12125
dc.sourceIIOimport
dc.titleScalability of stress induced by contact-etch-stop layers: a simulation study
dc.typeJournal article
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.source.peerreviewno
dc.source.beginpage1446
dc.source.endpage1453
dc.source.journalIEEE Trans. Electron Devices
dc.source.issue6
dc.source.volume54
imec.availabilityPublished - imec


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