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Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

dc.contributor.authorFedorenko, Yanina
dc.contributor.authorSwerts, Johan
dc.contributor.authorMaes, Jan
dc.contributor.authorTois, E.
dc.contributor.authorHaukka, S.
dc.contributor.authorWang, C.G
dc.contributor.authorWilk, G.
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-16T16:06:16Z
dc.date.available2021-10-16T16:06:16Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12149
dc.sourceIIOimport
dc.titleAtomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O
dc.typeJournal article
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageH149
dc.source.endpageH152
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue5
dc.source.volume10
imec.availabilityPublished - open access


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