Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

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Authors

Fedorenko, Yanina; Swerts, Johan; Maes, Jan; Tois, E.; Haukka, S.; Wang, C.G; Wilk, G.; Delabie, Annelies; Deweerd, Wim; De Gendt, Stefan

Issue

5

Journal

Electrochemical and Solid-State Letters

Volume

10

Title

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Publication type

Journal article

Embargo date

9999-12-31

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