Publication:

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Date

2007
Journal article
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cris.virtual.orcid0000-0001-9739-7419
cris.virtual.orcid0000-0003-3775-3578
cris.virtual.orcid0000-0001-7547-7194
cris.virtualsource.department36689418-e07f-4cc4-8c33-f09792001dfb
cris.virtualsource.department1fd77399-4d0a-4004-8a7f-9634c67c90de
cris.virtualsource.department5afcb429-ac38-4c13-8422-3088287ba9bd
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dc.contributor.authorFedorenko, Yanina
dc.contributor.authorSwerts, Johan
dc.contributor.authorMaes, Jan
dc.contributor.authorTois, E.
dc.contributor.authorHaukka, S.
dc.contributor.authorWang, C.G
dc.contributor.authorWilk, G.
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T16:06:16Z
dc.date.available2021-10-16T16:06:16Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12149
dc.source.beginpageH149
dc.source.endpageH152
dc.source.issue5
dc.source.journalElectrochemical and Solid-State Letters
dc.source.volume10
dc.title

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

dc.typeJournal article
dspace.entity.typePublication
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