Show simple item record

Ultra low concentration clean: a new approach to feol critical wafer surface cleaning

dc.contributor.authorFischer, Thomas
dc.contributor.authorPuri, Suraj
dc.contributor.authorHoyer, Ronald
dc.contributor.authorWostyn, Kurt
dc.contributor.authorJanssens, Tom
dc.date.accessioned2021-10-16T16:07:39Z
dc.date.available2021-10-16T16:07:39Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12155
dc.sourceIIOimport
dc.titleUltra low concentration clean: a new approach to feol critical wafer surface cleaning
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage167
dc.source.endpage174
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 11, issue 2


Files in this item

Thumbnail
Name:
16234.pdf
Size:
107.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record