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Comparison of HCl gas-phase cleaning with conventional and dilute wet chemistries

dc.contributor.authorElsmore, Chris
dc.contributor.authorHurd, Trace
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T14:28:47Z
dc.date.available2021-09-29T14:28:47Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1219
dc.sourceIIOimport
dc.titleComparison of HCl gas-phase cleaning with conventional and dilute wet chemistries
dc.typeProceedings paper
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage142
dc.source.endpage149
dc.source.conferenceProceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate9/10/1995
dc.source.conferencelocationChicago, IL USA
imec.availabilityPublished - open access
imec.internalnotesECS Proceedings; Vol. 95-20


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